1,2-Dimethyl-1,1,2,2-Tetraphenyldisilane 1,2-二甲基-1,1,2,2-四苯基乙硅烷

CAS 1172-76-5 MFCD00051536

化学结构图

1172-76-5
SMILES: C[Si](c1ccccc1)(c1ccccc1)[Si](C)(c1ccccc1)c1ccccc1

化学属性

Mol. FormulaC26H26Si2
Mol. Weight394.66
Melting Point142.0 to 146.0 deg-C
Boiling Point185°C/1mmHg(lit.)

别名和识别编码

Chemical Name1,2-Dimethyl-1,1,2,2-Tetraphenyldisilane
MDL NumberMFCD00051536
PubChem Substance ID70895
CAS Number1172-76-5
EC Number214-632-1
Chemical Name Translation1,2-二甲基-1,1,2,2-四苯基乙硅烷
Synonym 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetraphenyldisilane {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 1,2-Dimethyl-1,1,2,2-tetrapheny
InChIKeyJNZRJYXUMDPPRK-UHFFFAOYSA-N
LabNetwork Molecule IDLN02001706
Reaxys-RN2949874
Canonical SMILESC[Si](C1=CC=CC=C1)(C2=CC=CC=C2)[Si](C3=CC=CC=C3)(C)C4=CC=CC=C4
InChIInChI=1S/C26H26Si2/c1-27(23-15-7-3-8-16-23,24-17-9-4-10-18-24)28(2,25-19-11-5-12-20-25)26-21-13-6-14-22-26/h3-22H,1-2H3
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分类

  • {SNA} CVD and ALD Precursors by Metal, Chemical Synthesis, Disilanes, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silicon, Vapor Deposition Precursors, 材料科学
  • {SNA} CVD and ALD Precursors by Metal, Chemical Synthesis, Disilanes, Materials Science, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silicon, Vapor Deposition Precursors

相关文献及参考

  • Beil. 16 ,IV,1576

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P264+P265
  • P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通风良好的地方使用。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P302+P352
  • P304+P340
  • P305+P351+P338
  • P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感觉不适，呼叫解毒中心或医生/医师。
  • P319
  • P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
  • P332+P313
  • P332+P317
  • P337+P313
  • P337+P317
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P362+P364
  • P403+P233
  • P405 Store locked up. 上锁保管。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Hazard Codes Xi
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Signal word Warning
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
Storage condition 2-8°C {LY} 2-8°C {} {LY} 2-8°C {} {} {LY} 2-8°C {} {} {} {LY} 2-8°C {} {} {} {} {LY} 2-8°C {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {

系列性分类

  1. Chemical Synthesis 化学合成
  2. Organometallic Reagents 金属有机试剂
  3. Organosilicon 有机硅
  4. Disilanes - Organosilicon
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Silicon - CVD and ALD Precursors by Metal

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