Tantalum(V) Methoxide 甲醇钽(V)

CAS 865-35-0 MFCD00058817

化学结构图

865-35-0
SMILES: CO[Ta](OC)(OC)(OC)OC

化学属性

TSCANo
Flash Point189°C/10mm
Mol. FormulaC5H15O5Ta
Mol. Weight336
Appearance white pwdr.
Stabilitymoisture sensitive
Boiling Point189°C/10 mm
Melting Point50°C

别名和识别编码

Chemical NameTantalum(V) Methoxide
Beilstein Registry Number3675458
PubChem Substance ID24863946
Synonym TANTALUM(V) METHOXIDE 95+% Pentamethyl tantalate 甲醇钽(V) TANTALUM METHOXIDE Tantalum (V) methoxide TANTALUM PENTAMETHOXIDE Tantal(V)-methylat TANTALUM (V) METHOXIDE (99.99+%-TA) SPECTRO TANTALUM(V) METHOXIDE Pentamethoxytantalum; Tantalum pentamethoxide; Tantalum(V) methoxide Tantalum (V) methoxide (99.99+%-Ta) PURATREM TantalumVmethoxidewhitepowder 甲醇钽 TANTALUM METHYLATE Tantalum(V) methoxide
Chemical Name Translation甲醇钽(V)
MDL NumberMFCD00058817
CAS Number865-35-0
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分类

  • Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors, Tantalum
  • {SA} Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors, Tantalum
  • {uni_hamburg} no charge; 1fragment
  • {SNA} Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Solution Deposition Precursors, Tantalum, Tantalum Catalysts, 材料科学
  • {SNA} Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Solution Deposition Precursors, Tantalum,

相关文献及参考

  • Beil. 1 ,IV,1227
  • FT-IR 2 (3), 4487:A / Structure Index 1 , 484:A:2
  • Short: IV/20B Title: Vapor Pressure and Antoine Coefficients for Oxygen Containing Organic Compounds Author: Dykyj, J.; Svoboda, J.; Wilhoit, R.C.; Frenkel, M.; Hall, K.R. Editor: Hall, K.R. Source: Landolt-Börnstein, New Series Volume: IV/20B Year: 2000 Keyword: organic compounds; vapor pressure ISBN: 3-540-64968-9 ISBN: 978-3-540-64968-7 Internet Resource: DOI:10.1007/b71424 RefComment: VII, 320 pages.

安全信息

Precautionary statements
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
WGK Germany3
GHS Symbol
Signal word Danger
Hazard statements
  • H228 Flammable solid 易燃固体
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Hazard Codes F,Xi
Personal Protective Equipment Eyeshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges dust mask type N95 (US), Eyeshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
Safety Statements
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
  • S36/37 Wear suitable protective clothing and gloves 穿戴适当的防护服和手套；
UN Number UN3181 UN 1325 4.1/PG 2
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R11 Highly flammable 非常易燃
  • R22 Harmful if swallowed 吞咽有害
Storage condition Moisture Sensitive
Packing GroupIII
Hazard Class4.1

其他信息

  • 甲醇钽价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2010/05/25 18839 甲醇钽(V) Tantalum(V) methoxide 5g 1512元 2010/05/25 18839 甲醇钽(V) Tantalum(V) methoxide 25g 6846元 2010/05/25 18839 甲醇钽(V) Tantalum(V) methoxide 1g 330元
  • MOL 文件:865-35-0.mol
  • Alfa Aesar:甲醇钽(V) Tantalum(V) methoxide(865-35-0)
  • TSCA:No
  • F:10-21
  • Sigma Aldrich:865-35-0(sigmaaldrich)
  • 敏感性:Moisture Sensitive

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Tantalum - Catalysis and Inorganic Chemistry
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Solution Deposition Precursors - Micro/NanoElectronics
  4. Tantalum - Solution Deposition Precursors
  1. CVD & ALD Precursors
  1. Alkoxide
  2. Tantalum
  1. CVD & ALD Precursors
  2. Tantalum
  1. Metal Alkoxides for CVD & ALD
  2. Tantalum

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