2-(PERFLUORO-9-METHYLDECYL)ETHYL METHACRYLATE 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,12,12,12-二十氟-11-(三氟甲基)十二烷基甲基丙烯酸酯

CAS 74256-14-7 MFCD00236102

化学结构图

74256-14-7
SMILES: CC(=C)C(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F

化学属性

Mol. FormulaH2C=C(CH3)CO2CH2CH2(CF2)8CF(CF3)2
Mol. Weight682.22
Boiling Point110-111 °C/2 mmHg(lit.)
Melting Point28-32 °C(lit.)

别名和识别编码

Chemical Name3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,12,12,12-Eicosafluoro-11-(trifluoromethyl)dodecyl methacrylate
CAS Number74256-14-7
PubChem Substance ID24870987
EC Number277-789-5
MDL NumberMFCD00236102
Chemical Name Translation3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,12,12,12-二十氟-11-(三氟甲基)十二烷基甲基丙烯酸酯
Synonym 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,12,12,12-二十氟-11-(三氟甲基)十二烷基甲基丙烯酸酯
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分类

  • Acrylic Monomers, Fluorinated Acrylics, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly & Contact Printing
  • {SNA} Acrylic Monomers, Fluorinated Acrylics, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly & Contact Printing

安全信息

GHS Symbol
WGK Germany3
Hazard Codes Xi
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Signal word Warning
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后,立即用大量水冲洗并征求医生意见;
  • S36 Wear suitable protective clothing 穿戴适当的防护服;
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性

系列性分类


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