Tris(Tert-Butoxy)Silanol 三(叔丁氧基)硅烷醇

CAS 18166-43-3 MFCD00271024

化学结构图

18166-43-3
SMILES: CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C

化学属性

Boiling Point205-210 °C(lit.)
Mol. FormulaC12H28O4Si
Mol. Weight264.43
Appearance white liq. to semi-solid white solid
Stabilitymoisture sensitive
Melting Point63-65°C

别名和识别编码

Chemical NameTris(Tert-Butoxy)Silanol
Synonym TBS 三(叔丁氧基)硅烷醇
PubChem Substance ID329761906
Chemical Name Translation三(叔丁氧基)硅烷醇
MDL NumberMFCD00271024
CAS Number18166-43-3
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分类

  • {SNA} 14: Silicon, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Chemical Synthesis, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silanols, Silicon, Vapor Deposition Precursors, 材料科学
  • {SNA} Micro/NanoElectronics, Silanes, Silicon, Solution Deposition Precursors, 材料科学
  • {SNA} Materials Science, Micro/NanoElectronics, Silanes, Silicon, Solution Deposition Precursors
  • {SA} Materials Science, Micro/NanoElectronics, Silanes, Silicon, Solution Deposition Precursors

安全信息

WGK Germany3
Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors Packaged for Deposition Systems - Vapor Deposition Precursors
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Solution Deposition Precursors - Micro/NanoElectronics
  4. Silicon - Solution Deposition Precursors
  5. Silanes 硅烷
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Silicon - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. Alkoxide
  2. Silicon
  1. CVD & ALD Precursors
  2. Silicon
  1. Metal Alkoxides for CVD & ALD
  2. Silicon
  1. Silanes & Silanols for CVD & ALD
  2. Silicon

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