Tris(dimethylphenylphosphine)](2,5-norbornadiene)rhodium(I) hexafluorophosphate [三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I)

CAS 32761-50-5 MFCD02091681

化学结构图

32761-50-5
SMILES: [Rh+].CP(C)C1C=CC=CC=1.CP(C)C1C=CC=CC=1.CP(C)C1C=CC=CC=1.F[P-](F)(F)(F)(F)F.C1C2[CH][CH]C1[CH][CH]2 |^1:37,38,40,41|

化学属性

Mol. FormulaC31H41F6P4Rh
Mol. Weight754.45
Melting Point158-161 °C (lit.)

别名和识别编码

Chemical NameTris(dimethylphenylphosphine)](2,5-norbornadiene)rhodium(I) hexafluorophosphate
Synonym [(2,3-η)-Bicyclo[2.2.1]hepta-2,5-diene]tris(dimethylphenylphosphine)rhodium(I) hexafluorophosphate [三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I)
MDL NumberMFCD02091681
PubChem Substance ID24860485
Chemical Name Translation[三(二甲基苯基膦)](2,5-降冰片二烯)六氟磷酸铑(I)
CAS Number32761-50-5
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lithography Monomers, Materials Science, Micro/NanoElectronics, Rhodium, Self Assembly & Contact Printing
  • {SNA} Alicyclic/Etch-Resistant Monomers, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lithography Monomers,

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Signal word Warning
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Hazard Codes Xi
Safety Statements
  • S37/39 Wear suitable gloves and eye/face protection 穿戴适当的手套和眼睛/面保护；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Rhodium 铑
  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Chemicals by Class 化学分类法
  4. Halogenated 卤化物 (氟氯溴碘)
  5. Fluoro 氟化物
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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