Bis(methyl-η5-cyclopentadienyl)dimethylhafnium 二(甲基-η5-环戊二烯)二甲基铪

CAS 68193-43-1 MFCD16875684

化学结构图

68193-43-1
SMILES:

化学属性

Density1.60 g/mL±0.01 g/mL at 25 °C
Mol. Weight366.80
Mol. FormulaHf[C5H4(CH3)]2(CH3)2
Boiling Point80-120 °C/0.3-0.5 mmHg(lit.)
Melting Point60 °C(lit.)

别名和识别编码

Synonym HFCMME 二(甲基-η5-环戊二烯)二甲基铪 HFCMME HfD-CO2 HfD-CO2
MDL NumberMFCD16875684
CAS Number68193-43-1
Chemical NameBis(methyl-η5-cyclopentadienyl)dimethylhafnium
Chemical Name Translation二(甲基-η5-环戊二烯)二甲基铪
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分类

  • {SNA} 72: Hafnium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Hafnium, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
  • {SNA} 72: Hafnium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Hafnium, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学

相关文献及参考

  • 1. Wilk, G.D.; Wallace, R.M.; Anthony, J.M. , High-k gate dielectrics: current status and material properties considerations J. Appl. Phys. 89 , 5243, (2001)
  • 2. Gutsche, M.; Seidl, H.; Luetzen J.; Birner, A.; et. al IEDM , 18.6.1, (2001)
  • P. R.Chalker et. al. Appl. Phys. Lett. 93 , 182911, (2008)
  • J. Niinisto et al ., Atomic Layer Deposition of HfO 2 Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperatures Chem. Mater. , (2007)

安全信息

GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
WGK Germany3
Signal word Warning
Hazard Codes Xi
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S24/25 Avoid contact with skin and eyes 避免皮肤和眼睛接触；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Hafnium - CVD and ALD Precursors by Metal

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