Chlorendic Acid 氯菌酸

CAS 115-28-6 MFCD00167589

化学结构图

115-28-6
SMILES: O=C(O)C1C(C(=O)O)C2(Cl)C(Cl)=C(Cl)C1(Cl)C2(Cl)Cl

化学属性

Mol. FormulaC9H4Cl6O4
Mol. Weight389
Melting Point239-242 °C(lit.)
Appearance 易溶于丙酮、乙醇和甲醇等极性有机溶剂；微溶于水、苯、正已烷和四氯化碳等非极性溶剂。
Solubility溶解在甲醇几乎透明

别名和识别编码

Chemical NameChlorendic Acid
MDL NumberMFCD00167589
CAS Number115-28-6
PubChem Substance ID87570509
EC Number204-078-9
Synonym Bicyclo(2.2.1)hept-5-ene-2,3-dicarboxylic acid, 1,4,5,6,7,7-hexachloro- 1,4,5,6,7,7-Hexachloro-5-norbornene-2,3-dicarboxylic acid; 1,4,5,6,7,7-Hexachlorobicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid 1,4,5,6,7,7-HEXACHLORO-5-NORBORNENE-2,3-DICARBOXYLIC ACID 1,4,5,6,7,7-HEXACHLOROBICYCLO[2.2.1]HEPT-5-ENE-2,3-DICARBOXYLIC ACID HET acid 1,4,5,6,7,7-HEXACHLOROBICYCLO[2.2.1]-5-H Kyselina 3,6-endomethylen-3,4,5,6,7,7-hexachlor-delta 海特酸 1,4,5,6,7,7-六氯-二环[2.2.1]庚-5-烯-2,3-二甲酸; 1,4,5,6,7,7-六氯二环(2,2,1)-5-庚烯-2,3-二羧酸; 六氯内次甲基四氢邻苯二甲酸; 六氯桥亚甲基四氢酞酸; 1,4,5,6,7,7-六氯-5-降冰片烯-2,3-二羧酸; 海特酸 {Ch LABOTEST-BB 1,4,5,6,7,7-Hexachloro-5-norbornene-2,3-dicarboxylic acid CHLORENDIC ACID 1,4,5,6,7,7-六氯二环(2,2,1)-5-庚烯-2,3-二羧酸 3-dicarboxylicacid,1,4,5,6,7,7-hexachloro-Bicyclo[2.2.1]hept-5-ene-2 4 六氯内次甲基四氢邻苯二甲酸 HEXACHLORO-ENDO-METHYLENETETRAHYDROPHTHALIC ACID 氯菌酸 chlorendic Kyselina 1,2,3,4,7,7-hexachlorbicyklo(2,2,1)hept-2-en-5,6-dikarboxylova 3,4,5,6,7,7-Hexachloro-3,6-endomethylenetetrahydrophthalicacid 1,4,5,6,7,7-hexachloro-bicyclo[2.2.1]hept-5-ene-3-dicarboxylicacid 1,4,5,6,7,7-六氯-5-降冰片烯-2,3-二羧酸 bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylicacid,1,4,5,6,7,7-hexachloro- Kyselina 3,6-endomethylen-3,4,5,6,7,7-hexachlor-delta(sup 1,4,5,6,7,7-hexachloro-5-norbornene-2,3-dicarboxy Hexachloro-endo-methylenetetrahydrophthalic acid HET ACID Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid, 1,4,5,6,7,7-hexachloro- -tetrahydroftalova 5-Norbornene-2,3-dicarboxylic acid, 1,4,5,6,7,7-hexachloro- 氯橋酸 六氯桥亚甲基四氢酞酸 氯桥酸
Chemical Name Translation氯菌酸
Reaxys-RN1892213
Beilstein Registry Number1892213
InChIKeyDJKGDNKYTKCJKD-UHFFFAOYSA-N
Wiswesser Line NotationL55 A CUTJ AG AG BG EG FG GG
LabNetwork Molecule IDLN01742479
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Self Assembly & Contact Printing, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Self Assembly & Contact Printing

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P202 Do not handle until all safety precautions have been read and understood. 已阅读并理解所有的安全预防措施之前，切勿操作。
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P332+P313
  • P201 Obtain special instructions before use. 使用前获取专门指示。
  • P405 Store locked up. 上锁保管。
  • P305+P351+P338+P337+P313
  • P301+P312+P330
Hazard statements
  • H351 Suspected of causing cancer 怀疑致癌
  • H318 Causes serious eye damage 严重伤害眼睛
  • H302 Harmful if swallowed 吞食有害
RTECSRB9000000
Signal word Danger
Personal Protective Equipment Eyeshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
Hazard Codes Xi
Safety Statements
  • S22 Do not breathe dust 不要吸入粉尘；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S53 Avoid exposure - obtain special instructions before use 避免接触，使用前获得特别指示说明；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
Risk Statements
  • R40 Limited evidence of a carcinogenic effect 有限证据表明其致癌作用
  • R41 Risk of serious damage to eyes 有严重损伤眼睛的危险
TYPE OF TEST            : TDLo - Lowest published toxic dose
ROUTE OF EXPOSURE       : Oral
SPECIES OBSERVED        : Rodent - mouse
DOSE/DURATION           : 108 gm/kg/2Y-C
TOXIC EFFECTS :
   Tumorigenic - Carcinogenic by RTECS criteria
   Liver - tumors
REFERENCE :
   NTPTR* National Toxicology Program Technical Report Series.  (Research
   Triangle Park, NC 27709) No.206-  Volume(issue)/page/year: NTP-TR-304,1987

TYPE OF TEST            : TDLo - Lowest published toxic dose
ROUTE OF EXPOSURE       : Oral
SPECIES OBSERVED        : Rodent - rat
DOSE/DURATION           : 45063 mg/kg/2Y-C
TOXIC EFFECTS :
   Tumorigenic - Carcinogenic by RTECS criteria
   Liver - tumors
REFERENCE :
   NTPTR* National Toxicology Program Technical Report Series.  (Research
   Triangle Park, NC 27709) No.206-  Volume(issue)/page/year: NTP-TR-304,1987

TYPE OF TEST            : Cytogenetic analysis
TEST SYSTEM             : Rodent - hamster Lung
DOSE/DURATION           : 975 mg/L
REFERENCE :
   MUREAV Mutation Research.  (Elsevier Science Pub. B.V., POB 211, 1000 AE
   Amsterdam, Netherlands) V.1-    1964-  Volume(issue)/page/year: 369,243,1996

TYPE OF TEST            : Mutation in mammalian somatic cells
TEST SYSTEM             : Rodent - mouse Lymphocyte
DOSE/DURATION           : 1700 mg/L
REFERENCE :
   NTPTR* National Toxicology Program Technical Report Series.  (Research
   Triangle Park, NC 27709) No.206-  Volume(issue)/page/year: NTP-TR-304,1987

其他信息

  • 可燃性危险特性:热分解排出有毒氯化物烟雾
  • 类别:有毒物质
  • 灭火剂:水,二氧化碳, 泡沫, 干粉
  • 刺激数据:皮肤-兔 500 毫克/24小时 轻度; 眼睛-兔 0.25 毫克/24小时 重度
  • 氯菌酸价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2014/06/02 H0054 氯菌酸 Chlorendic Acid 25G 734元
  • 毒性分级:中毒
  • MOL 文件:115-28-6.mol
  • MSDS 信息:1,4,5,6,7,7-Hexachlorobicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid(115-28-6).msds
  • 图谱信息:氯菌酸(115-28-6)核磁图( 1 HNMR) 氯菌酸(115-28-6)红外图谱(IR1) 氯菌酸(115-28-6)质谱(MS) 氯菌酸(115-28-6)核磁图( 13 CNMR) 氯菌酸(115-28-6)红外图谱(IR2)
  • 储运特性:库房低温通风干燥
  • Sigma Aldrich:115-28-6(sigmaaldrich)
  • TCI Shanghai:氯菌酸 Chlorendic Acid,>;98.0%(T)(115-28-6)
  • 急性毒性:口服-大鼠 LD: >; 1000 毫克/公斤
  • 下游产品:氯桥酸酐

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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