Trichloro(P-Tolyl)Silane 对甲苯三氯硅烷

CAS 701-35-9 MFCD00045131

化学结构图

701-35-9
SMILES: Cc1ccc([Si](Cl)(Cl)Cl)cc1

化学属性

Mol. FormulaC7H7Cl3Si
Mol. Weight226
Refractive indexn20/D 1.5240(lit.)
Boiling Point218-220
Density1.273
Flash Point98°(208°F)
TSCAYes

别名和识别编码

Chemical NameTrichloro(P-Tolyl)Silane
CAS Number701-35-9
PubChem Substance ID69697
EC Number211-854-0
MDL NumberMFCD00045131
Synonym 4-METHYLPHENYLTRICHLOROSILANE 4-methylphenyltrichlorosilane 4-甲苯基三氯化硅烷 4-甲苯基三氯硅烷 p-Tolyl-trichlorsilan p-Tolyltrichlorosilane Silane, trichloro(4-methylphenyl)- Silane, trichloro-p-tolyl- TRICHLORO-P-TOLYLSILANE Tolyltrichlorosilane Trichloro(4-methylphenyl)silane Trichloro(p-tolyl)silane Trichloro(p-tolyl)silane Trichloro(p-tolyl)silane4-Methylphenyltrichlorosilane p-Tolylsilyl trichloride p-Tolylsilyl trichloride silanetricnloro(4-methylphenyl) trichloro(4-methylphenyl)-Silane trichloro(4-methylphenyl)-silan trichloro-p-tolyl-silane trichloro-p-tolylsilane 对甲苯三氯硅烷
Beilstein Registry Number1866557
Chemical Name Translation对甲苯三氯硅烷
InChIKeyWOMUGKOOLXQCTQ-UHFFFAOYSA-N
LabNetwork Molecule IDLN02001899
InChIInChI=1S/C7H7Cl3Si/c1-6-2-4-7(5-3-6)11(8,9)10/h2-5H,1H3
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分类

  • {SNA} Chemical Synthesis, Micro/NanoElectronics, Nanomaterials, POSS Precursors and Intermediates, Protecting and Derivatizing Reagents, Protection and Derivatization, RSiCl3, Self Assembly & Contact Printing, Self-Assembly Materials, Silanes, Silicon-Based, Silsesquioxanes: POSS Nanohybrids, Synthetic Reagents, 材料科学
  • {uni_hamburg} no charge; carbocycle; aromatic; 6RingOnly; 6ring; 1fragment
  • Chemical Synthesis, Materials Science, Micro/NanoElectronics, Nanomaterials, POSS Precursors and Intermediates, Protecting and Derivatizing Reagents, Protection and Derivatization, RSiCl3, Self Assembly & Contact Printing,

相关文献及参考

  • Beil. 16 ,912
  • FT-IR 2 (3), 4421:D / Structure Index 1 , 475:D:3
  • Short: III/35D2 Title: Nuclear Magnetic Resonance (NMR) Data: Chemical Shifts for Carbon-13, Part 2: Aromatic Compounds Author: Mikhova, B. Editor: Gupta, R.R.; Lechner, M.D. Source: Landolt-Börnstein, New Series Volume: III/35D2 Year: 2005 Keyword: aromatic compounds; carbon-13; chemical shift; coupling constant; molecular structure ISBN: 978-3-540-20189-2 ISBN: 3-540-20189-0 Internet Resource: DOI:10.1007/b83345 RefComment: VIII, 291 p., Hardcover RefComment: Written for Science and engineers in the fields of physics, chemistry and physical chemistry who inted to use NMR to study the structure and the binding of molecules Abstract: Nuclear Magnetic Resonance (NMR) is based on the fact that certain nuclei exhibit a magnetic moment, orient by a magnetic field, and absorb characteristic frequencies in the radiofrequency part of the spectrum. The spectral lines of the nuclei are highly influenced by the chemical environment i.e. the structure and interaction of the molecules. NMR is now the leading technique and a powerful tool for the investigation of the structure and interaction of molecules. The present Landolt-Börnstein volume III/35 Nuclear Magnetic Resonance (NMR) Data is therefore of major interest to all scientists and engineers who intend to use NMR to study the structure and the binding of molecules. Volume III/35 "NMR-Data" is divided into several subvolumes and parts. Subvolume III/35A contains the nuclei 11B and 31P, subvolume III/35B contains the nuclei 19F and 15N, subvolume III/35C contains the nucleus 1H, subvolume III/35D contains the nucleus 13C, subvolume III/35E contains the nucleus 17O, and subvolume III/35G contains the nucleus 77Se. More nuclei will be presented later.
  • Short: III/35F Title: Nuclear Magnetic Resonance (NMR) Data: Chemical Shifts and Coupling Constants for Silicon-29 Author: Marsmann,

安全信息

GHS Symbol
WGK Germany3
Hazard Codes 8
Hazard statements
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Precautionary statements
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
Signal word Danger
UN Number 2987 UN 2987 8/PG 2 UN2987
Risk Statements
  • R14 Reacts violently with water 遇水会猛烈反应
  • R34 Causes burns 会导致灼伤
Safety Statements
  • S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S27 Take off immediately all contaminated clothing 立即脱掉全部污染的衣服；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
Storage condition Moisture Sensitive
Packing GroupII
Hazard Class8

其他信息

  • 对甲苯三氯硅烷价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2010/05/25 B21728 对甲苯三氯硅烷, 97% p-Tolyltrichlorosilane, 97% 5g 216元 2010/05/25 B21728 对甲苯三氯硅烷, 97% p-Tolyltrichlorosilane, 97% 25g 694元 2010/05/25 B21728 对甲苯三氯硅烷, 97% p-Tolyltrichlorosilane, 97% 100g 2380元
  • Sigma Aldrich:701-35-9(sigmaaldrich)
  • MOL 文件:701-35-9.mol
  • 敏感性:Moisture Sensitive
  • Alfa Aesar:对甲苯三氯硅烷,97% p-Tolyltrichlorosilane, 97%(701-35-9)
  • TSCA:Yes

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Self-Assembly Materials - Self Assembly & Contact Printing
  5. Silanes - Self-Assembly Materials
  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Protection and Derivatization - Synthetic Reagents
  4. Protecting and Derivatizing Reagents - Protection and Derivatization
  5. Silicon-Based - Protecting and Derivatizing Reagents
  1. Materials Science 材料科学
  2. Nanomaterials - Materials Science
  3. Silsesquioxanes: POSS® Nanohybrids - Nanomaterials
  4. POSS® Precursors and Intermediates - Silsesquioxanes: POSS® Nanohybrids
  5. RSiCl3 - POSS® Precursors and Intermediates
  1. Chemical Synthesis 化学合成
  2. Organometallic Reagents 金属有机试剂
  3. Organosilicon 有机硅
  4. Silanes 硅烷

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